Deposition system for fabrication of metal dielectrics (oxides or fluorides ) nanocomposites.
The figure of the deposition system combined e-beam evaporation
(for fabrication of fluoride films) and pulsed laser depositon for
nanometrically controlled doping by rare earth ions or metals nanoparticles.
The sample was characterised by HRTEM and spectral elipsometry.
Optical emission spectroscopy
- monochromator Triax iHR550 equipped a grating 1200 g/mm and LN cooled CCD camera
- spectra taken at the distance of 100 mm from the target
- spectral region from 200 to 1000 nm
- resolution +-~0.05 nm (typical)
Mass spectroscopy
- mass spectrometer EQP 500 HIDEN Analytical Ltd.
- spectra from 1 to 300 amu
- resolution ~ 0.5 amu
Optical
Electrical
- 4-wire measurement (Agilent 34411A, Keithley 6221, 2182A)
- sampling rate: 5 Hz
- sample dimension: 15 x 7 mm2
- Ag electrodes spacing: 6 mm
- Result: resistance and I-V curve
