Laboratory of Physical Vapour Deposition

In the field of thin films fabrication by Physical Vapour Depositions techniques we developed and constructed the new technologies for different kind of coatings and nanostructural thin films fabrications. The attention is focused to development hybrid deposition techniques with auxiliary plasma discharges for optical, magnetic and organics films. In our research we don’t want to use one deposition technique, for example magnetron sputtering, for fabrication of some specific coatings. The scientific idea in our PVD laboratory is for particular physical and technological problems to find the best methods to fabricate the films and nanostructure with the demand structural and functional (luminescence or magnetic) properties. This method is schematically shown in Fig bellow. The attention will be paid also to plasma characterisation and the examination of its influence to the film properties as well as for the application of different techniques suitable (e.g. spectral ellipsometry and reflectometry, real time electrical and transmission measurements) for in situ thin films characterisations.